Ilim ha’m ja’miyet Issue 1-1 (2023) · pp. 4-6

PULSE PHOTON PROCESSING OF A THIN-FILM Si/Mg/Si/Sitall System

Asanov, D.J.

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Abstract

This is not a sufficient condition for creating silicide-silicon heterojunctions and building new semiconductor devices. Therefore, it is of undoubted interest to develop new methods for the formation of Mg2Si films on silicon, in which higher temperatures can be used to improve the crystalline quality of the films. In this work, the rapid heat treatment (RHT) method was used to form magnesium silicide. on the basis of which the optimal temperatures and pulse durations for the synthesis of magnesium silicide are determined

tez issiqlik bilan ishlov berish (TIB)magniy silicidiimpulsli fotonik ishlov berishgeterostrukturaSi/Mg/Si/sitall tizimiбыстрая термическая обработка (БТО)силицид магнияимпульсная фотонная обработкагетероструктурасистема Si/Mg/Si/ситалл

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Cite

APA 7 
Asanov, D.J. (2023). PULSE PHOTON PROCESSING OF A THIN-FILM Si/Mg/Si/Sitall System. Ilim ha’m ja’miyet, (1-1), 4-6.
GOST R 7.0.5 
Asanov, D.J. PULSE PHOTON PROCESSING OF A THIN-FILM Si/Mg/Si/Sitall System // Ilim ha’m ja’miyet. 2023. № 1-1. С. 4-6.
BibTeX 
@article{d.j.2023,
  author  = {Asanov, D.J.},
  title   = {PULSE PHOTON PROCESSING OF A THIN-FILM Si/Mg/Si/Sitall System},
  journal = {Ilim ha’m ja’miyet},
  year    = {2023},
  number  = {1-1},
  pages   = {4-6}
}
RIS 
TY  - JOUR
AU  - Asanov, D.J.
TI  - PULSE PHOTON PROCESSING OF A THIN-FILM Si/Mg/Si/Sitall System
JO  - Ilim ha’m ja’miyet
PY  - 2023
IS  - 1-1
SP  - 4
EP  - 6
ER  -